Applications of Semiconductor Diffusion Furnaces
Each customer has unique and specific requirements from their install base of Diffusion & LPCVD Furnace systems. With over 30 years of experience of manufacturing Semiconductor Thermal processing equipment, we have a strong track record in delivering applications and solutions that meet the needs of end users. Our solutions include new, remanufactured, certified used, and as is equipment. Our offerings can be configured to suit a range of thermal processes in both atmospheric and LPCVD applications, with a strong technical team to aid you through the installation, commissioning and process development phases.
CTR Semiconductor Diffusion Furnaces
Compact semiconductor diffusion furnaces offer processing capabilities for up to 300 mm round, 156 mm square substrates, or irregularly shaped parts with the same process applications as full-size platforms. Designed for world-class processing performance, Expertech’s CTR systems feature full recipe control and storage via a host PC supervisor with data logging and graphic capabilities. Our high-technology compact thermal processing solutions include manual or fully automated loading systems to deliver benefits such as:
- Highly Reliable Thermal Processing Platforms
- A wide range of High-Performance Heating Elements
- Atmospheric & LPCVD Processing Capabilities
- Designed using best known methods
- Interlock implementation for optimum control and process safety
- Integrated Control System with GUI for Interfacing with Multiple Tools
- Lowest Energy Footprint in Equipment Class with a Compact Design
- Stackable Design to Accommodate 4 CTR-125, 4 CTR-150, 3 CTR-200, and 2 CTR-300
- Includes Process Controller Options
- Manageable Rate of Wafer Load and Unload with Optional Recipe Controlled Loading Mechanism
- Low Cost of Ownership
VTR Semiconductor Diffusion Furnaces
Vertical semiconductor diffusion furnaces provide a highly automated solution with robust design features and a small cleanroom and energy footprint. As one of the most well-known furnace designs worldwide, Expertech’s VTR system delivers exceptional within-wafer and wafer-to-wafer uniformity in atmospheric and LPCVD processes. We offer high-performance solutions for advanced manufacturing benefits, including:
- Adaptable Manufacturing
- Improved Automation & Throughput through dual boat design
- Optimized Environmental and Contamination Control
- Cost-Effective Ownership
- Wafer processing from 100mm to 200mm
- Cassette to Cassette processing
- Adaptable load size for process uniformity optimization
- Dual size capability for wafer size transition
Diffusion Furnace Application Processes & Capabilities
Applications involving SiC, GaN, Semiconductor, and MEMS device processing require exceptional film uniformity and low defect density. With over 30 years of technical expertise, we understand how to develop innovative equipment that meets your process requirements, including unique solutions to introduce new film types, augment production capacities for existing processes, and other specialized configurations. Expertech can design and manufacture horizontal and vertical furnace systems for the following processes:
LPCVD Thermal Diffusion Processes
- Stochiometric Nitride (Si3N4)
- Anti-Reflection Coatings (ARC)
- Low-Stress Nitride (Si Rich Nitride) < 250 MPa
- Ultra-Low Stress Silicon Nitride < 100 MPa
- Undoped Polysilicon or a-Silicon
- Phosphorous-Doped Polysilicon or a-Silicon
- Boron-Doped Polysilicon or a-Silicon
- Undoped Poly-SiGe
- Phosphorous or Boron-Doped Poly-SiGe
- Undoped Low Temperature Oxide (LTO)
- Phosphorous-Doped Glass (PSG)
- Boron and Phosphorous-Doped Glas (BPSG)
- Undoped Deposited Oxide by TEOS
- Phosphorous-Doped TEOS Oxide (PSG)
- Boron and Phosphorous-Doped TEOS (BPSG)
Atmospheric Pressure Processes
- Wet or Dry Oxidation/Densification
- Dry/Wet/Dry Gate Oxide Cycles
- Inert Gas Anneals/Densification (N2, Ar, He)
- Contact Sintering / Alloy (N2, Forming Gas)
- Reducing Atmosphere Anneals (Forming Gas)
- Phosphine + O2 Phosphorous Doping
- Phosphine Gas Phase Doping
- POCl3 + O2 – Liquid Source Phosphorous Doping
- BBr3 + O2 – Liquid Source Boron Doping
- Solid Source Phosphorus Doping
- Solid Source Boron Doping
- Drive-in/Redistribution
Contact Us for Powerful Thermal Processing Solutions & Comprehensive Support
Expertech is a provider of new and refurbished vertical, compact and horizontal reactor systems, with a range of comprehensive services to support the needs, throughout the lifetime of your equipment. We develop high-performance semiconductor Thermal Process Equipment to meet the specific needs of your facility, providing a reliable platform for various process applications. In addition to our high-performance solutions, we maintain one of the largest inventories of thermal reactor parts. Our experts can adapt, repair, and improve the functionality of current and obsolete systems, as well as offer system training for your processing equipment.
Supported by the Expertech advantage, we ensure competitive prices and efficient delivery of your products with a complete customer satisfaction guaranteed. Contact Expertech to discuss your equipment specifications or request a quote to begin.